Design an asymmetrical three-beam LIL for fabricating micro- and nano- structuresThursday (25.06.2020) 13:10 - 13:30 Room 2
Multi-beam laser interference lithography (LIL) has become one of the most important techniques and shown significant advantages in the fabrication of micro- and nano- structures. Controlling intensity ratio of optical distributions is a key issue in LIL for fabricating micro- and nano-structures. This paper presents an asymmetrical three-beam LIL system which effectively improves the intensity ratio of optical distributions. Comparing with the traditional three-beam interference, the asymmetrical three-beam LIL achieved the intensity ratio of optical distribution 1 to 4 times higher when producing the same interference pattern. In addition, this system also avoids modulation patterns in multi-beam LIL systems and reduces the difficulty of actual LIL processing. A Fast Fourier Transform (FFT) analysis that was used to study the pattern distributions of the asymmetrical three-beam interference from frequency spectra  shows the pattern with a high-intensity array can be obtained by adjusting the parameter settings of incident laser beams. The asymmetrical three-beam LIL system was verified through fabricating patterns on photoresist. The experimental results are in good agreement with the theoretical analysis.
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