Student Combination of nanosecond pulsed laser and Aerosol Assisted Chemical Vapor Deposition for ZnO growthFriday (26.06.2020) 11:30 - 11:50 Room 1
Aerosol assisted Chemical Vapor Deposition (AACVD) is a thermally activated technique that uses microdroplets as deposition precursor. The aim of the present study is to increase the advantages of this novel deposition technique developing a new laser-based method denominated Pulsed Laser-Enhanced AACVD (LEAACVD). Laser interaction with the substrate produces a localized increase in temperature, to know this variation, experimental measurements and simulations have been done. The deposited material is ZnO, which is one of the most important semiconductor materials with wide relevance in scientific community. To characterize the morphology and composition of the layer, the samples were analyzed in a Feg-Sem microscope, Energy-Dispersive X-ray spectroscopy (EDX) and AFM. This innovative technique allows the deposition of thin films and the direct writing of structures in a single-step process, which is a leap towards faster thin film patterning techniques.
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