Analysis of shielding and re-deposition effects during processing of metals with single and double pulsesWednesday (24.06.2020) 10:00 - 10:20 Room 1
It has been shown that when using double pulses with a total pulse energy equal to the pulse energy of a single pulse, the volume ablated by the double pulses can be significantly lower than the volume ablated by a single pulse. This is due to a re-deposition effect, which has been studied both numerically and experimentally: The first pulse of a double pulse ablates material, while the second pulse is either shielded by this material and/or causes re-deposition of this material.
In order to understand the dynamics of the re-deposition process in more detail, Molecular dynamic (MD) simulations of the ablation process of copper with single and double pulses have been carried out. In the talk, the re-deposition process is evaluated dependent on the applied fluence. The physical background of shielding and re-deposition on the microscopic scale are discussed in detail and the results are related to experimental findings.
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