Process optimization of Direct Laser Interference PatterningWednesday (24.06.2020) 13:31 - 13:34 Room 1
Direct laser interference patterning (DLIP) has proven to be fast and, at the same time, a high-resolution method for the fabrication of large-area surface structures. However, in order to provide structures with adequate quality and defined morphology at the highest possible througput, the processing parameters have to be carefully selected. This involves the optimization of numerous process parameters, where the most relevant are the laser pulse energy, beam diameter, frequency, scan/translation speed, the distance between pulses (overlap), and the hatch-distance. Therefore, the development of a protocol powered by theoretical model is highly required to optimize these parameters.
This work introduces an analytical model to optimize the DLIP process parameters for achieving the maximal possible fabrication speed for a target structure depth and a mean laser power. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy and repetition rate. The developed model considers structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel employing picosecond DLIP system (10 ps), using a laser source operating at a 1064 nm wavelength. The fabricated line-like periodic structures were characterized by scanning electron and confocal microscopy. The prediction of the analystical model showed a difference of only 10% compared to the experimental results.
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